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January 23, 2026
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: Monday, February 9, at 10:00 in room 488 - Contact
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Optical Lithography
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Optical Lithography
E-Beam Lithography System (JEOL JBX-8100FS)
Heidelberg MLA-150 Maskless Lithography System
Neutronix-Quintel NxQ4006: 100mm mask aligner (currently single side)
Vanguard Photonic Wirebonder
HEADWAY PWM32 and PWM50: Photoresist spinners
LAURELL WS-400-6NPP-LITE: Photoresist spinner
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